Department News
Nano-fabrication Technologies and Nano-structures for CMOS and
Seminar Date
2002-12-20
Author
안지영
Date
2002-12-20
Views
1572
1. 제 목 : Nano-fabrication Technologies and Nano-structures for CMOS and Bioelectronics
2. 연 사 : Yang-Kyu Choi
(Post-doctoral researcher in the University of California, Berkeley )
3. 일 시 : 2002년 12 월 23일 월요일 오전11시
4. 장 소 : 301동 1512호
5. 요 약 :
Nano-fabrication technologies including nanosphere lithography, spacer lithography, and imprint lithography are developed and experimentally demonstrated. Dual-resist process, a combination of optical resist and e-beam resist, was proposed to improve throughput as well as resolution. RF NEMS (Nano-Electro-Mechanical Systems) was fabricated for a resonant frequency above 1.4GHz. Spacer lithography technology using deposited sidewall by LPCVD (Low Pressure Chemical Vapor Deposition) produces sub-10nm patterns with i-line lithography. They are applied to make nanoscale CMOS devices and sub-10nm narrow gap vertical capacitors for DNA sequencing without labeling. These technologies can produce extremely compact nano-wires for chemical and biological sensors as well as memory devices and well-ordered nano-particles for forming nano-catalysts and growing carbon nano-tubes with multiple spacer lithography, imprint lithography, and metal lift-off. Nano-pillars were fabricated by one step plasma etching. They were applied to enhance interface characteristics between solid-state devices and neurons for neural recording. This high density nanopillars (carpet structures) showed super hydrophobic characteristics, which would be used for self-assembly of MEMS. The rough surface due to nano-pillars amplified Raman scattering signal, which improved molecular detection without labeling.
Nano-technologies have received much attention. As devices scale down to atomic scale, common area can be enlarged in the area of traditional silicon-based CMOS technology, NEMS, and bio-technology because all devices are composed of atoms. Thus, these technologies should meet together and its synergy can give us more inspiration. It is believed that “fusion technology” (combination of CMOS device, NEMS, and Bio-NEMS) will lead next cutting edge research and open a new era.
6. 문 의 : 기계항공공학부 김민수 교수 (☏880-8362)
2. 연 사 : Yang-Kyu Choi
(Post-doctoral researcher in the University of California, Berkeley )
3. 일 시 : 2002년 12 월 23일 월요일 오전11시
4. 장 소 : 301동 1512호
5. 요 약 :
Nano-fabrication technologies including nanosphere lithography, spacer lithography, and imprint lithography are developed and experimentally demonstrated. Dual-resist process, a combination of optical resist and e-beam resist, was proposed to improve throughput as well as resolution. RF NEMS (Nano-Electro-Mechanical Systems) was fabricated for a resonant frequency above 1.4GHz. Spacer lithography technology using deposited sidewall by LPCVD (Low Pressure Chemical Vapor Deposition) produces sub-10nm patterns with i-line lithography. They are applied to make nanoscale CMOS devices and sub-10nm narrow gap vertical capacitors for DNA sequencing without labeling. These technologies can produce extremely compact nano-wires for chemical and biological sensors as well as memory devices and well-ordered nano-particles for forming nano-catalysts and growing carbon nano-tubes with multiple spacer lithography, imprint lithography, and metal lift-off. Nano-pillars were fabricated by one step plasma etching. They were applied to enhance interface characteristics between solid-state devices and neurons for neural recording. This high density nanopillars (carpet structures) showed super hydrophobic characteristics, which would be used for self-assembly of MEMS. The rough surface due to nano-pillars amplified Raman scattering signal, which improved molecular detection without labeling.
Nano-technologies have received much attention. As devices scale down to atomic scale, common area can be enlarged in the area of traditional silicon-based CMOS technology, NEMS, and bio-technology because all devices are composed of atoms. Thus, these technologies should meet together and its synergy can give us more inspiration. It is believed that “fusion technology” (combination of CMOS device, NEMS, and Bio-NEMS) will lead next cutting edge research and open a new era.
6. 문 의 : 기계항공공학부 김민수 교수 (☏880-8362)
